Influence of surface activation on the microporosity of PE‐CVD and PE‐ALD SiO _<i>x</i> thin films on PDMS

The microporosity, structure and permeability of SiOx thin films deposited by microwave plasma-enhanced chemical vapour deposition (PE-CVD) atomic layer (PE-ALD) on polydimethylsiloxane (PDMS) substrates were investigated positron annihilation spectroscopy complementary technique, such as X-ray photoelectron spectroscopy, infrared time flight mass force microscopy. onto spin-coated PDMS substrates, which previously exposed to an oxygen plasma thus achieving the conversion top polymer into SiOx. presence this oxidised surface near region led overall decrease in micropore density a shift towards smaller pore sizes within films. A correlation between fluence during treatment microporosity PE-CVD PE-ALD could be established.